Effect of an External Magnetic Field on the Absorption Efficiency of the RF Power in a Spatially Bounded Inductive Plasma Source

Abstract

The measured dependences of the equivalent plasma resistance on the external magnetic field (0–50 G) in a 46-cm-diameter RF inductive plasma source operating at frequencies of 2, 4, and 13.56 MHz and a power of 100–500 W are presented. The experiments were carried out in argon at pressures of 0.1–30 mTorr. The presence of the external magnetic field leads to the appearance of resonance domains of efficient RF power absorption corresponding to the conditions of resonance excitation of helicons coupled with Trivelpiece–Gould modes. It is shown that RF power absorption at frequencies of 2 MHz can be optimized by applying an external magnetic field corresponding to the domains of resonance absorption. The effect is enhanced with increasing operating frequency.