Effect of Al doping in the Ag layer of MgZnO/Ag/MgZnO dielectric/metal/dielectric UV–visible transparent conductive films

Abstract

AbstractTransparent conductive films (TCFs) with dielectric/metal/dielectric (DMD) structure covering the UVA (λ = 315–380 nm) and visible wavelength region (380–780 nm) were fabricated using Al‐doped Mg0.4Zn0.6O (AMZO) dielectric and 1.7 at% Al‐doped Ag (Ag(Al)) metal layers. The AMZO/Ag(Al)/AMZO‐DMD film with a 7 nm thick Ag(Al) layer after annealing in vacuum at 400 °C showed superior performance as a TCF, i.e., average transmittance from UVA to visible region (315–780 nm) of 88.2% and sheet resistance of 7.6 Ω/sq. The effect of Al doping on optical transmission, sheet resistance, surface morphology, and thermal durability of the AMZO/Ag(Al)/AMZO‐DMD films were also investigated. The 1.7 at% Al doping suppressed the initial island growth of the thin Ag layer and the plasmon resonance absorption dipped in the optical transmission spectra. Al doping in the Ag layer also improved the thermal durability of AMZO/Ag/AMZO‐DMD films. The threshold temperature for Ag void formation caused by metal segregation increased from 300 °C (DMD with a pure Ag layer) to 400 °C (DMD with an Al‐doped Ag layer). (© 2016 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)