Abstract
Edge emitting quantum cascade microlasers based on InP have been fabricated and investigated. Deeply etched Bragg mirrors have been manufactured at the end of the resonators, to reduce the mirror losses of short cavity devices. In order to achieve the required high aspect ratio, an optimized plasma dry etching process has been developed, which allows monolithic device fabrication in a single dry etching step. The short resonator length results in a large Fabry-Pérot mode spacing, which leads to a single mode operation. A side mode suppression ratio of about 20dB at 80K has been observed.
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