ECR Plasma CVD Using a Slotted Lisitano Coil

Abstract

An ECR plasma is produced at relatively high pressures up to 25 mTorr with a slotted Lisitano coil 140 mm in diameter, and the radial distributions of plasma parameters are measured. It is found that the plasma is almost radially uniform even at pressures higher than 10 mTorr. Carbon films are formed on silicon wafers by introducing methane gas into the ECR plasma and the deposition rate is examined as a function of concentration of methane gas and substrate temperature. Furthermore, the physical properties of the films are analyzed by X-ray diffraction and Raman scattering. These results show that a slotted Lisitano coil is very useful for the ECR plasma CVD.