Abstract
We investigate the first stages of nanocrystalline diamond (NCD) thin film growth at low substrate temperature. NCD films were grown on silicon substrates by microwave plasma enhanced chemical vapor deposition (CVD) for 0–300 min at a temperature of 410 °C. Si substrates were ultrasonically seeded in suspension of detonation nanocrystalline diamond powder. The seeding density approached values up to 1 ⁎ 10 12 cm − 2 , which allows growth of ultra-thin fully closed layers. Stagnation of the AFM roughness indicates that the low temperature NCD growth is a) delayed due to the surface contamination of the used nanodiamond powder and b) possibly dominated by the growth in the lateral direction. XPS measurements showed that the measured surface exhibits changes from a multi-phase composite (seeding layer) to single-phase one (NCD layer).
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