Abstract
The characteristics of interface layer and the effect of mole fraction of inlet gas mixture(B2H6/H2/N2/TiCl4) on the microstructure of Ti(B,N) films were studied by microwave plasma hot filament CVD process. Ti(B,N) films were deposited on a substrate(STD-61) to develop a high performance of resistance wear coating tool. Ti(B,N) films were obtained at a gas pressure of 1 torr, bias voltage of 300 V and substrate temperature of 480℃ in B2H6-H2-N2-TiCl4gas system. It was found that TiN, TiB2, TiB and hexagonal boron nitride(h-BN) phases exist in thin layer on the STD-61.
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