Abstract
Etch hillocks formation was studied experimentally and modeled using the Monte Carlo method. Simulations were used to explore the consequences of site-dependent detachment probabilities on surface morphology for a one- and two-dimensional substrate models. Comparison with pyramidal etch hillocks that are regularly observed in anisotropic etching of Si(1 0 0) are presented. The steady-state morphologies are analyzed and the hillock size distributions determined. The mechanisms responsible for the steady-state morphologies are described.
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