Abstract
The dynamic scaling approach is an important tool for describing the time evolution of rough interfaces. It computes dynamic scaling parameters α and β, which characterize surface and time correlations. Applications of dynamic scaling to random deposition and ballistic deposition are discussed. A model of random adsorption on fractal substrates is presented. Then the influence of surface diffusion on adsorption is analyzed. The dependence of α and β on the substrate fractal dimension, together with the dependence of the fractal dimension of the gas–solid interface on adsorption coverage are computed.
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