Abstract
AbstractEley‐Rideal reaction mechanism is studied over rough surface of random deposition model. Two types of rough surface are considered: (1) different rough surface with same surface density and (2) different rough surface with different surface density. Dynamic scaling theory, which is generally applied to the growing surface, is applied for this reaction mechanism to obtain the temporal and spatial scaling parameters α and β. The scaling parameters are found to be negative in contrast to the positive scaling parameters in surface growth model. The values of β are the same for both types of surface whereas the values of α are different. © 2004 Wiley Periodicals, Inc. Int J Chem Kinet 36: 286–292, 2004
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