Dynamic Polarization Patterning Technique for High-Quality Liquid Crystal Planar Optics

Abstract

The Pancharatnam–Berry (PB)-phase liquid crystal (LC) planar optical elements, featuring large apertures and a light weight, are emerging as the new generation optics. The primary method for fabricating large-aperture LC planar optical elements is through photo-alignment, utilizing polarization laser direct writing. However, conventional polarization direct writing suffers from an inertia-induced stopping step during splicing, leading to suboptimal optical effects. Here, we propose a novel highly efficient method for arbitrary polarization patterning, significantly reducing interface splicing errors in these optical elements. (We call it dynamic polarization patterning technology). This process involves simultaneous mobile splicing and real-time generation of different polarization patterns for exposure, eliminating the inertia-related splicing interruption. As a demonstration, we fabricated a lens with an aperture of approximately 1 cm within 30 min at 633 nm. Furthermore, we developed a 100% fill-factor lens array (3 × 3) with an element lens diameter of approximately 7 mm within 1.5 h at 532 nm. Their focal lengths were uniformly set at 30 cm, demonstrating superior convergence capabilities within their designated working wavelengths, alongside commendable performance in converging light across various other wavelengths. Our measurements confirmed the good focusing performance of these samples. The convergence spot size of the lens deviated by approximately 40% from the theoretical diffraction limit, whereas the lens array exhibited a deviation of around 30%. The dynamic polarization direct writing during uniform platform movement reduced splicing errors to a mere 100–200 nm. The enhancement in imaging quality can be primarily attributed to the innovative use of mobile polarization splicing exposure technology, coupled with the inherent self-smoothing properties of LC molecules. This synergy significantly mitigates the impact of seam diffraction interference.