Abstract

Detailed investigations on the frequency dependent polarizabilities, transition energies, oscillator strengths, and transition probabilities of two electron systems He, Be2+, C4+, and O6+ under electric dipolar (E1) and quadrupolar (E2) excitations have been performed using exponential cosine screened coulomb potential with a view to understand the structural behaviour of such systems due to external confinement produced by plasma environment. Time dependent coupled Hartree–Fock theory within a variational framework has been adopted for studying the first three low lying excited states 1s2:1Se→1snp:1Po (n = 2, 3, 4) and 1snd:1De (n = 3, 4, 5) under such excitations. Quantitatively, the effect of confinement produced by the external plasma has been taken care of by considering the change in atomic potential through plasma screening, directly related to the coupling strength of the plasma with the atomic charge cloud. With increased plasma screening, a gradual destabilisation of the energy levels with subsequent reduction of the ionization potential and number of excited states has been observed. Behavioral pattern of the frequency dependent polarizabilities, excitation energies, oscillator strengths, and transition probabilities under systematic increase of the screening has been investigated. Results have been compared thoroughly with those available for free systems and under confinement by exponential cosine screened and screened Coulomb potential.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.