Abstract
A Dynamic High Pressure (DHP) system has been developed, tested and implemented in the scanning photoelectron microscope (SPEM) operated at ESCAmicroscopy beamline at Elettra synchrotron. The system consists of a compact gas injection set up that allows experiments with local pressure near the sample several orders of magnitude higher that the allowable pressure for X-ray photoelectron spectroscopy setups. The DHP setup controls the amount of gas injected toward the sample by fine tuning the time and spatial profiles using a pulsed valve and a nozzle, respectively. The DHP functionality and effectiveness has been demonstrated by in operando oxidation experiments of Ru and Si. The obtained results confirmed that using the DHP the gas exposure onto the sample is equivalent to a static pressure between 10−3 and 10−2 mbar, about 3 orders of magnitude higher than the maximum gas pressure for the XPS machines under operation.
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