Dynamic error analysis for six degrees of freedom micro-displacement mechanism in reticle stage of lithography machine

Abstract

Multi-layer lithography machine is one of the crucial equipments in the semiconductor integrated circuit industry. Recently, more and more research interests have been attracted to develop higher precision lithography machine. The error analysis plays an important role in the development of ultra-precision lithography machine. In this paper, the error analysis of six degrees of freedom micro-displacement mechanism of reticle stage in multi-layer lithography is studied. Based upon the geometric model of micro-displacement mechanism, an error analysis model is established through kinematic method and homogeneous coordinate array. Orthogonal test is adopted to reveal the quantitative relationship between the motor errors and the output errors in resultant movement. A brief discussion on the influence of motor errors in different directions is proposed. This error model provides a theoretical basis for design and optimization of lithography machine.