Dwell time adjustment for focused ion beam machining

Abstract

Focused ion beam (FIB) machining is potentially useful for micro/nano fabrication of hard brittle materials, because the removal method involves physical sputtering. Usually, micro/nano scale patterning of hard brittle materials is very difficult to achieve by mechanical polishing or dry etching. Furthermore, in most reported examples, FIB machining has been applied to silicon substrates in a limited range of shapes. Therefore, a versatile method for FIB machining is required. We previously established the dwell time adjustment for mechanical polishing. The dwell time adjustment is calculated by using a convolution model derived from Preston’s hypothesis. More specifically, the target removal shape is a convolution of the unit removal shape, and the dwell time is calculated by means of one of four algorithms. We investigate these algorithms for dwell time adjustment in FIB machining, and we found that a combination a fast Fourier transform calculation technique and a constraint-type calculation is suitable. By applying this algorithm, we succeeded in machining a spherical lens shape with a diameter of 2.93μm and a depth of 203nm in a glassy carbon substrate by means of FIB with dwell time adjustment.