Abstract
We present the design and fabrication of a novel dual-function subwavelength fused-silica grating that can be used as a polarization-selective beam splitter. For TM polarization, the grating can be used as a two-port beam splitter at a wavelength of 1550 nm with a total diffraction efficiency of 98%. For TE polarization, the grating can function as a high-efficiency grating, and the diffraction efficiency of the -1st order is 95% under Littrow mounting. This dual-function grating design is based on a simplified modal method. By using the rigorous coupled-wave analysis, the optimum grating parameters can be determined. Holographic recording technology and inductively coupled plasma etching are used to manufacture the fused-silica grating. Experimental results are in agreement with the theoretical values.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have