Abstract
Resolution improvement is an on-going goal in scanning electron microscope development. High resolution is required at both high and low accelerating voltages in a wide field of applications, including, but not exclusive to, semiconductors and new materials development. Two approaches which result in improved resolution through-out the operating voltage range of the SEM are 1) the adoption of low aberration objective lenses, and 2) the use of high brightness electron sources.The DS-130F SEM which is described here uses a high brightness thermal field emission gun (TFEG) in conjunction with a modified DS-130 column. The electron optical configuration is quite unique, as it includes two independent stages. The top stage places the sample within a high field strength low aberration objective lens, resulting in ultra high resolution on samples up to 18 x 8 mm. The bottom stage accommodates 6” samples and uses a second dedicated conical objective lens allowing a short working distance to be maintained on tilted samples.
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Schedule a callMore From: Proceedings, annual meeting, Electron Microscopy Society of America
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