Abstract
Dual Ni and Ir catalysis enables the preparation of arylsilanes having a (TMS)3Si substituent from the corresponding aryl bromides and (TMS)3SiH at 30 °C using visible-light irradiation. This protocol avoids strong bases, high temperature and air and moisture sensitive silyl reagents, providing the expected arylsilanes in moderate to good yields. The reaction was shown to proceed through a silyl radical, likely generated by hydrogen atom abstraction from (TMS)3SiH by a bromide radical.
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