Dual mode operation, highly selective nanohole array-based plasmonic colour filters

Abstract

Taking advantage of nanostructured metal films as plasmonic colour filters (PCFs) has been evolved remarkably as an alternative to the conventional technologies of chemical colour filtering. However, most of the proposed PCFs depict a poor colour purity focusing on generating either the additive or subtractive colours. In this paper, we present dual mode operation PCFs employing an opaque aluminium film patterned with sub-wavelength holes. Subtractive colours like cyan, magenta, and yellow are the results of reflection mode of these filters yielding optical efficiencies as high as 70%–80% and full width at half maximum of the stop-bands up to 40–50 nm. The colour selectivity of the transmission mode for the additive colours is also significant due to their enhanced performance through the utilization of a relatively thick aluminium film in contact with a modified dielectric environment. These filters provide a simple design with one-step lithography in addition to compatibility with the conventional CMOS processes. Moreover, they are polarization insensitive due to their symmetric geometry. A complete palette of pure subtractive and additive colours has been realized with potential applications, such as multispectral imaging, CMOS image sensors, displays, and colour printing.