Abstract

A dual-frequency plasma source has many advantages in applications. In this paper, a dual-frequency microwave plasma source is presented. This microwave plasma source is based on a coaxial transmission line without the resonator, and it can be operated in a wide band frequency region. Two microwaves are inputted from two ports into the plasma reactor: one is used firstly to excite the plasma and the other one is used to adjust plasma characteristics. Based on the COMSOL Multiphysics simulation, the experiment is carried out. In the experimental investigation, the plasma electron density and electron temperature can be controlled, respectively, by feeding in different frequencies from the second port, causing the particles at different energy levels to present different frequencies. This exploratory research improves the operation frequency of dual-frequency microwave plasma sources from RF to microwave.

Highlights

  • To control plasma characteristics flexibly, the dual-frequency plasma source has been proposed and investigated [1,2,3,4,5,6,7,8]

  • Based on the COMSOL Multiphysics simulation, a dual-frequency microwave plasma source is proposed and investigated. This dual-frequency microwave plasma source is based on the coaxial transmission line, and 2450 and 915 MHz microwaves are utilized in this study

  • The plasma was excited by a 2450 MHz microwave from Port 1 first, and a 915 MHz microwave was inputted from Port 2 to adjust the plasma characteristics

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Summary

Introduction

To control plasma characteristics flexibly, the dual-frequency plasma source has been proposed and investigated [1,2,3,4,5,6,7,8]. When the inputted 2450 MHz microwave power is at 500 W, the electron density near Port 2 is much lower than that near Port 1.

Results
Conclusion
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