Dry reforming of methane over Ni/ZrO2 and NiCu/ZrO2 thin layer nanocatalysts in a microchannel reactor: The effect of coating time

Abstract

AbstractIn this study, the performance of thin film Ni/ZrO2 and NiCu/ZrO2 catalysts in a microchannel reactor in the dry methane reforming reaction (DRM) is investigated. Thin film nanocatalysts are prepared by the physical vapor deposition (PVD) method. GIXRD, FESEM‐Cross, FESEM‐Surface, and EDX analyzes are used to evaluate the properties of thin film nanostructures. The results show that in addition to the addition of copper as a promoter, a change in the coating time causes a change in the formation of the thin layer and the growth mechanism of the layers. Reactor tests are evaluated at temperatures ranging from 700°C to 800°C, at P = 1 atm, with a CH4:CO2 ratio of 1. Results of this study are compared with two other studies in fixed bed reactors that show the microchannel reactor has better performance. The presence of copper on Ni/ZrO2 could have significant effects on the stability of hydrogen production and the reduction of carbon deposition. Thin film Ni/ZrO2 catalyst with 2 min coating time and NiCu/ZrO2 catalyst with NiCu weight ratio of 4: 1 with 1 min coating time at 800°C show the best performance in terms of hydrogen production and H2/CO ratio (1.43 for a sample of Ni/ZrO2 and 1.68 for a sample of NiCu/ZrO2).