Dry etching characteristics of Mo and Al2O3 films in O2/Cl2/Ar inductively coupled plasmas

Abstract

An investigation of etching characteristics and mechanisms of thin Mo and Al2O3 films in O2/Cl2/Ar inductively coupled plasmas under the condition of fixed gas pressure (0.8Pa), input power (700W) and bias power (200W) was carried out. It was found that an increase in the O2 mixing ratio resulted in a non-monotonic Mo etching rate (with a maximum of 320nm/min at 40–45% O2) while the Al2O3 etching rate decreased monotonically. Plasma parameters and composition were investigated using a combination of a zero-dimensional plasma model and plasma diagnostics by double Langmuir probes. The analysis of etching kinetics involving model-predicted fluxes of plasma active species allows one to relate the non-monotonic Mo etching rate to the change in reaction probability.