Droplet-free high-density metal ion source for plasma immersion ion implantation

Abstract

This paper reports on plasma parameters and ion composition of droplet-free Zr ion source for plasma immersion ion implantation and deposition (PIII&D). Zirconium (Zr) ions were obtained by ionizing sputtered Zr atoms in inductively-coupled argon discharge. The characteristics of plasma density, plasma potential and electron temperature were typical ones of such a inductive discharge, and the plasma parameters were not significantly influenced by mixing the sputtered Zr atoms into the plasma. Actually, the main ionic component was still Ar+ ions, and the ion density ratio of [Zr+]/[Ar+] was as low as ∼8%. Increase in sputtering rate of the Zr source will be necessary to improve the ion density ratio.