Abstract
Conventional moiré magnifier suffers from high manufacturing cost and poor scalability due to the stringent requirement on alignment between the microfocusing element array and micropattern array (MPA). By superposition of the microreflective element array and MPA together to form hierarchical microstructure, not only the alignment can be done during mold fabrication process, which is easily scalable and compatible to semiconductor, but also the synthetically magnified image is visible as viewed from both front and back side. The investigation of the moiré magnifier with hierarchical microstructure unveils new imaging phenomenon in moiré imaging device, and thereby offers a facile and low-cost platform to address challenges to open up a potential avenue in micro-optic involved three-dimensional display or anti-counterfeiting applications.
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