Abstract
A double hollow cathode ion source can produce high current and a high amount of metal ions (Mo, Ta, etc.) by using a new sputtering mode of hollow cathode discharge. A high density plasma is formed inside the narrow canal of the second hollow cathode, which is located between the first hollow cathode and an anode along an axial magnetic field (0.6–1.5 kG). A negative sputter voltage is applied to the second hollow cathode with respect to the anode, resulting in sputtering and ionization of the refractory material of this cathode. In the case of a Mo or Ta sputter target with an argon carrier gas, the metal ion ratio reaches 49–51% at a sputter voltage in the range 460–580 V. A total ion beam current of 9.0 mA is obtained at an extraction voltage of 20 kV.
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