Double-drift-region ion-implanted millimeter-wave IMPATT diodes

Abstract

A detailed experimental comparison between double-drift-region (DDR) and single-drift-region (SDR) millimeter-wave avalanche diodes is presented. For 50-GHz CW operation, DDR diodes have given a maximum of 1-W output power compared to 0.53 W for the SDR diodes, while maximum efficiencies of 14.2 percent for the DDR and 10.3 percent for the SDR diodes have been obtained. These results are in agreement with the theory of Scharfetter et al. [1] for DDR IMPATT diodes. Both the DDR and SDR diode measurements were made on room temperature, metal heat sinks. The DDR diodes were shown to operate at significantly lower junction temperatures for the same value of output power, indicating a potential reliability advantage. Ion implantation was used to make the p drift region of the p+p-n-n+50-GHz DDR devices. Otherwise the fabrication (which includes diffusion and epitaxial technologies) and the microwave measurement methods were identical for both types of diodes. Capacitance measurements were compared with calculations to determine the desired doping concentrations for frequencies from 43 to 110 GHz. Experimental results for the higher frequency millimeter-wave region have been obtained on DDR structures with both p and n drift regions implanted. At 92 GHz an output power of 0.18 W and an efficiency of 7.4 percent have been obtained.