Double dielectrics enhancement on the LDMOS using high-k field dielectric and low-k buried dielectric

Abstract

This paper investigates the double dielectrics enhancement LDMOS (DDE LDMOS) with high-k field dielectric and low-k buried dielectric. The analytical models of the potential and electric field, optimal breakdown voltage and drift doping concentration are established for this novel LDMOS. The validity of the analytical models is confirmed by the simulation results. Based on the analytical and simulated results, the modulation mechanism of the high-k field dielectric and low-k buried dielectric on the electric field and breakdown characteristics of DDE LDMOS are analyzed and compared. Compared to the conventional LDMOS, the specific on-resistance of DDE LDMOS is reduced by 19%, the breakdown voltage and figure of merit (FOM) of the DDE LDMOS can be improved by 62% and 222.4% when the permittivity of high-k field dielectric and low-k buried dielectric are 100 and 2. Meanwhile, the transfer characteristic, output characteristic, frequency characteristic, and switching characteristic of the DDE LDMOS are also discussed.