Double-Barrier Quantum-Well Structure: An Innovative Universal Approach for Passivation Contact for Heterojunction Solar Cells

Abstract

The main drawbacks of modern solar-cell technologies are low-quality surface passivation, recombination losses, and carrier selectivity, which limit their efficiency. Therefore, this study proposes an innovative universal approach for a double-barrier two-dimensional (2D) quantum well (QW) passivation structure for solar cells. To this end, c-Si solar cells were examined as model cells. Preliminary investigations (e.g., contact resistance, passivation, and recombination current density) were conducted with a stack of SiOx/nc-Si/SiOx QW on n-type surfaces, and excellent results were obtained with a 30 nm-thick nc-SiOx(n) carrier-selective layer. Furthermore, the effects of different QW thicknesses and doping doses on the surface passivation of such contacts were studied, and the best results were achieved for a 5 nm QW. These QWs also exhibited a low degree of dopant diffusion, which was suppressed by the double SiOx layer. Furthermore, the 2D QW passivation structure with carrier-selective layers, which was denoted as a heterojunction with quantum well (HQW) solar cell, exhibited an excellent passivation improvement and had a lifetime (τeff) of 2746 μs and an implied open-circuit voltage (iVoc) of 736 mV for a 5 nm 2D QW structure. Moreover, a fabricated 5 nm 2D QW-based silicon heterojunction (SHJ) solar cell exhibited an open-circuit voltage (Voc) of 732.5 mV, a short-circuit current density (Jsc) of 39.5 mA/cm2, a fill factor (FF) of 77.95%, and an efficiency (Eff) of 22.55%. To validate these findings, theoretical calculations were performed using the experimental results, which confirmed the resonance tunneling of charge carriers across the 5 nm HWQ structure.