Abstract
AbstractProperties of undoped– and doped–ferroelectric PbZr1−xTixO3. films, with both Pt or RuO2 electrodes, were compared, with a view to understand the reasons for degradation of ferroelectric films. Donor–doped (e.g., Nb5+ at Ti4+ site) PbZr1−xTixO3 films, for which the PbO loss has been compensated, showed higher resistance to fatigue and low leakage currents compared to those of undoped films. The fatigue of ferroelectric films, a decrease in switchable polarization with increasing number of polarization reversals, has been attributed to the migration of oxygen vacancies and their entrapment at various interfaces (e.g., electrode/ferroelectric interface) that are present in the film.
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