Abstract
In order to investigate the processes which determine preferential sputtering of compounds, changes of surface composition of Ta 2O 5 due to bombardment with 1.5 keV He + ions were studied as a function of the angle of incidence. Preferential sputtering was characterized by the equilibrium surface composition, measured by Auger electron spectroscopy, the characteristic fluence to reach equilibrium and the depth of the altered layer. For more grazing incidence of the ion beam a significant decrease of the preferential sputtering effect was observed. Changing the angle of incidence from 90° to 10° relative to the surface changes the equilibrium Ta/O ratio by a factor of 3 and the characteristic fluence to reach equilibrium by a factor of 200 between 80° and 10°. These results can be explained by the assumption that the sputtering is dominated by reflected particles, whose number and mean energy increase with decreasing angle of incidence. In the same angular range the depth of the altered layer decreases approximately by a factor of sin ψ.
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