Abstract
We have observed five electron traps with energy levels at 0.16, 0.30, 0.40, 0.53 and 0.67 eV below the conduction band in Pd and H doped Si by DLTS technique. Successive annealing at 373 K and 473 K for 30 min respectively caused two levels at Ec-0.16 eV and Ec-0.67 eV to disappear and simultaneously a new level to emerge at Ec-0.19 eV. From such annealing behavior and the comparison of the energy levels observed in the present study with those in the literature, we assign them to various Pd and H related defects as follows, Pd-H2: Ec-0.16 eV and Ec-0.67 eV, Pd acceptor: Ec-0.19 eV, Pd-H3: Ec-0.30 eV, Pd-H1: Ec-0.40 eV.
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