DLTS SPECTRA OF SILICON DIODES WITH P+—N–JUNCTION IRRADIATED WITH HIGH ENERGY KRYPTON IONS

Abstract

p +- n -Diodes have been studied. The diodes were manufactured on wafers (thickness 460 μm, (111) plane) of uniformly phosphorus doped float–zone–grown single–crystal silicon. The resistivity of silicon was 90 Ohm · cm and the phosphorus concentration was 5 · 1013 cm–3. The diodes were irradiated with 250 MeV krypton ions. The irradiation fluence was 108 cm–2. Deep–level transient spectroscopy (DLTS) was used to examine the defects induced by high energy krypton ion implantation. The DLTS spectra were recorded at a frequency of 1 MHz in the 78—290 K temperature range. The capacity–voltage characteristics have been measured at a reverse bias voltage from 0 to –19 V at a frequency of 1 MHz. We show that the main irradiation–induced defects are A–centers and divacancies. The behavior of DLTS spectra in the 150—260 K temperature range depends essentially on the emission voltage U e. The variation of U e allows us to separate the contributions of different defects into the DLTS spectrum in the 150—260 K temperature range. We show that, in addition to A–centers and divacancies, irradiation produces multivacancy complexes with the energy level E t = E c – (0.5 ± 0.02) eV and an electron capture cross section of ~4 · 10–13 cm2.