Abstract
The distribution status of trace oxygen in the ferro-silicon nitride (Fe3Si-Si3N4) was investigated at the present, which was prepared by flash combustion synthesis method from FeSi75. The results showed that while the grain size of FeSi75 used in preparing Fe3Si-Si3N4 was less than0.074 mm, “active oxidation” occurred firstly, silicon was oxidized to form gaseous SiO(g), oxygen partial pressure was reduced in the system, silicon reacted with nitrogen directly to form Si3N4 while the system oxygen partial pressure approached less than 10-19MPa (T=1823K). O2(g) promoted the formation of Si3N4, Gaseous SiO(g) finally reacted with nitrogen and Si to form Si2N2O. The ferro silicon nitride was characterized by X-ray diffractometer and scanning electron microscope, the distribution of Si2N2O was uneven in the silicon nitride, and Si2N2O mainly distributed around Fe3Si or near the hole.
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