Abstract
To fabricate a high performance double-layered medium, the underlayer should be satisfied not only good magnetic properties, but also good crystallinity and crystalline orientation in order to realize the homogenous and fine crystalline growth of Co-Cr recording layer. We have already proposed a new type target for a DC magnetron sputtering source to fabricate a tape medium continuously. The permalloy films sputtered by the new target show the good magnetic properties and crystallinity even at a high power. And so we investigate the application of this target to fabricating of the rigid disks. In this paper, we mention about the distribution of magnetic property of the Ni-Fe-Nb films sputtered by the new target, and examine the appropriate structure of this target.
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