Distribution of contact pressure over the surface of ceramic floor tiles during the polishing process

Abstract

Abstract Assisted with computational simulation this work quantitatively determined the distribution of contact pressure over the surface of porcelain stoneware tiles during the industrial polishing process. In modern polishing lines there are basically three movements responsible for the scratching velocity and the position of the abrasives. Combining the kinematic equations obtained by these movements with a pre-existing model the contact pressure between abrasive tool and tile surface could be determined as function of time. The spatial distribution of average, standard deviation and maximum values of contact pressure were then obtained and mapped over the entire surface. The simulation results showed that the contact pressure tends to be 50% higher near to the center, in regions worked by the innermost abrasives. Additionally, periodical variations of up to 10% were found to occur due to the partial retreat of the abrasive tool.