Dissolution of a silver film in silicon glasses under electron bombardment

Abstract

It is shown that the under the action of an electron beam with electron energy E > 10 keV and electron irradiation dose Q ≥ 20 mQ/cm2 on silicate glasses coated with a silver film 80–100 nm in thickness, the silver film is dissolved partially or completely. The main mechanisms inducing this effect are the formation of a negative space charge under the glass surface, field emission of positive silver ions from the field, and migration of silver ions to the space charge region.