Abstract
AbstractDissolution inhibition mechanisms of naphthoquinone diazides in novolak based positive photoresists were investigated from three different aspects: • Dipolar interaction. • Interfacial chemical reactions. • Chemical structures of naphthoquinone diazides. The results suggest that there exists a hydrogen bonding interaction between the compounds with the matrix novolak resin and that naphthoquinone diazides would crosslink the resin in contact with an alkaline developer, both of which contribute to dissolution inhibition mechanisms. However, there seems to exist another dissolution inhibition mechanism; namely, 1,2‐naphthoquinone diazide does not inhibit dissolution of the matrix novolak resin at all while a clear dissolution inhibition effect Is observed for its derivatives containing sulfonyl groups. In the present paper, three dissolution inhibition mechanisms of naphthoquinone diazides will be proposed.
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