Abstract
Although Cu redistribution during dissolution of Al-Cu alloys is thought to have an important influence on susceptibility to localized corrosion, the details of the redistribution process in different environments are still not clear. This work uses in-situ x-ray absorption spectroscopy to follow the oxidation state of Cu in intermetallic Al2Cu and Al-4%Cu thin films during dissolution under potential control, in pH 10 borate and near-neutral Cl- environments. The oxidation state of Cu is observed to change only following significant dissolution of Al at potentials well above open circuit. In borate, formation of Cu (I) and Cu (II) occurs at potentials below the equilibrium potential for Cu/Cu2O, suggesting that the surface Cu is electrically isolated from the matrix. At higher potentials and longer exposure times, Cu ions went into solution, but subsequent re-plating of Cu on the surface was not observed.
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