Dissociative attachment of electrons with Si 2H 6

Abstract

Cross-sections for the production of negative ion fragments by electron attachment to Si 2H 6 and ion pair formation from it have been measured by utilizing the crossed electron beam-molecular beam collision technique. The negative ions are mass analyzed by employing a quadrupole mass spectrometer. There are serious disagreements between the present and two previously published results. In the present paper cross-section values, appearance potentials, and the various channels of dissociation for the formation of negative monosilane fragments are presented.