Abstract
Clean cleaved Si(111) surfaces were exposed to NH3 up to a few langmuirs and studied by low energy electron diffraction, Auger electron spectroscopy, electron energy loss spectroscopy and photoemission yield spectroscopy. The sticking coefficient is unity almost up to saturation which occurs at a N coverage of 14 monolayer. There, the surface structure is 1 × 1 with some disorder, the ionization energy and the work function are decreased by 0.425 and 0.6 eV, respectively, and the clean surface state band is replaced by a narrow band, 0.1 eV below the valence band edge. The results are explained by a high degree of dissociation of the adsorbed NH3 molecules, mainly into N, or NH and H atoms without large loss of hydrogen.
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