Abstract
A continuum model, based on the damped Kuramoto-Sivashinsky equation, is shown to reproduce the morphology evolution during ion sputtering quite successfully. In a very narrow range of the damping parameter $\ensuremath{\alpha},$ the alignment of the structures into hexagonal domains is obtained under normal incidence of ions with striking resemblance to the experimentally observed dot patterns. The origin of this damping factor is discussed.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
