Abstract
Thermal annealing of radiation-induced atomic hydrogen in high purity silica glass was studied by electron spin resonance (ESR) in the temperature range of 95 to 185 K. We found the H0 decay kinetics to be dispersive and to exhibit a strong isotope effect. Taken together with data of diffusive transports of O2 and H2 in high purity silica reported in the literature, our results suggest that the inhomogeneity in the structure of glassy silica is the root of the observed dispersive diffusion transport.
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