Dislocation Glide Velocity in N- and P-Doped Si1−xGex Layers on Si (001)

Abstract

ABSTRACTMisfit dislocation glide velocities in Si.94Ge.06 layers doped to 2.1018cm−2 with boron were measured over the temperature range 500 – 600°C and found to be up to two times slower than that of undoped material. Arsenic doped Si.932Ge.0ee layers on silicon were also studied, and the glide velocity was found to be enhanced by a factor of 80 at the lowest temperature (500°C) and highest doping level (9.1018cm−2) consistent with a decrease in the activation energy for glide from approximately 2eV to 1.3eV as the doping level was increased.