Discrete Relaxation Method for Triple Patterning Lithography Layout Decomposition

Abstract

In this paper, we consider the triple patterning lithography layout decomposition problem. To address the problem, a discrete relaxation theory is built. For designing a discrete relaxation based decomposition framework, we propose a surface projection method for identifying native conflicts in a layout, and then constructing the conflict graph. Guided by the theory, the conflict graph is reduced to small size subgraphs by vertex removals, which is a discrete relaxation. Furthermore, by ignoring stitch insertions and assigning weights to features, the layout decomposition problem on the small subgraphs is further relaxed to a 0-1 program, which is solved by the Branch-and-Bound method. To obtain a feasible solution of the original problem, legalization methods are introduced to legalize a relaxation solution. At the legalization stage, we prior utilize one-stitch insertion to eliminate conflicts, and use a backtrack coloring algorithm to obtain a better solution. We test our decomposition approach on the ISCAS-85 & 89 benchmarks. Comparisons of experimental results show that our approach finds solutions of some benchmarks better than those by the state-of-the-art decomposers. Especially, according to our discrete relaxation theory, some optimal decompositions are obtained.