Abstract
External-laser-induced preionization of excimer lasers was investigated. A discharge XeF laser was preionized by two different UV lasers [a KrF laser (λ=249 nm) and an ArF laser (λ=193 nm)], and the improvements in performance of the XeF laser were compared. The XeF laser beam profiles were measured by an intensified CCD (ICCD) camera with temporal resolution of 10 ns. Striated XeF laser profiles were obtained with 249 nm laser preionization, whereas there was no striation in the profiles for 193 nm laser preionization. These striations originated from discharge in the XeF laser induced by laser preionization. The influence of excited rare-gas atoms on the discharge instability was examined.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
