Discharge dynamics, plasma kinetics and gas flow effect in argon–acetylene discharges

Abstract

We investigated capacitively coupled Ar/C2H2 RF plasmas with a 1D fluid model that couples a 13.56 MHz discharge module, a long timescale chemical module and a flow transport module. A new solution procedure was developed in order to accurately describe the coupling between the short timescale discharge dynamics and the long characteristic time processes that play a major role in the molecular growth of reactive species. The plasma was simulated for different inlet gas configurations and flowrates. We showed that for a showerhead configuration one may distinguish two situations. For short residence time the plasma was strongly electronegative in the very center of the discharge gap and dominated by large hydrocarbon positive and negative ions. In this situation the acetylene conversion, although moderate, lead to a significant molecular growth. For long residence time, although C2H2 underwent a total conversion, the products of the primary C2H2 dissociation process were consumed by surface deposition which reduced drastically the molecular growth in the short gap discharge considered here. Whatever the conditions, we confirmed the key-role of Ar* in the acetylene conversion, ionization kinetics as well as the subsequent molecular growth for neutral and charged species. We also showed that remote feed gas and showerhead configurations predicted similar results at low flowrate. At larger flowrate the two configurations presented some discrepancy. Especially H2 density was much larger for the remote feed gas configuration, which affected the overall plasma behavior. Our results highlight that realistic gas-flow models are essential for an accurate description of acetylene conversion in Ar/C2H2 plasma.