Abstract
The depth-dependent structure of a poly(styrene-b-methylmethacrylate) (PS-PMMA) line grating (46 nm pitch) was calculated from quantitative analysis of small-angle X-ray scattering profiles. These data demonstrate that domain shapes are significantly deformed near the substrate interface, where the local PS domain shape resembles an hourglass. The bulk equilibrium dimension is recovered near the center of a 64 nm thick film. Simulations based on self-consistent field theory suggest that deformations near the substrate are caused by extensive penetration of the copolymer domains into the underlying substrate coating (a PS-brush). These findings suggest that new coatings for block copolymer directed self-assembly should consider copolymer penetration lengths in addition to tailoring surface energetics. Furthermore, given the resolution and ensemble-averaging features of synchrotron X-ray scattering, we argue that it has the potential to emerge as a "gold-standard" or "benchmark" dimensional metrology and library validation tool for high density, sub-10 nm features.
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