Directed Gas-Phase Formation of Aminosilylene (HSiNH2; X1A'): The Simplest Silicon Analogue of an Aminocarbene, under Single-Collision Conditions.

Abstract

The aminosilylene molecule (HSiNH2, X1A')-the simplest representative of an unsaturated nitrogen-silylene-has been formed under single collision conditions via the gas phase elementary reaction involving the silylidyne radical (SiH) and ammonia (NH3). The reaction is initiated by the barrierless addition of the silylidyne radical to the nonbonding electron pair of nitrogen forming an HSiNH3 collision complex, which then undergoes unimolecular decomposition to aminosilylene (HSiNH2) via atomic hydrogen loss from the nitrogen atom. Compared to the isovalent aminomethylene carbene (HCNH2, X1A'), by replacing a single carbon atom with silicon, a profound effect on the stability and chemical bonding of the isovalent methanimine (H2CNH)-aminomethylene (HNCH2) and aminosilylene (HSiNH2)-silanimine (H2SiNH) isomer pairs is shown; i.e., thermodynamical stabilities of the carbene versus silylene are reversed by 220 kJ mol-1. Hence, the isovalency of the main group XIV element silicon was found to exhibit little similarities with the atomic carbon revealing a remarkable effect not only on the reactivity but also on the thermochemistry and chemical bonding.