Abstract
Using simulations of a coarse-grained model, we examine the ability of topographic and chemical patterns to direct the self-assembly of thin films of copolymers into a defect-free array of vertical cylinders. The topographic pattern is a trench where the diblock is confined, whereas the chemical pattern consists of spots that interact preferentially with the minority block. The self-assembly process is described with Monte Carlo simulations of the standard model of block copolymers. While fully three-dimensional, the simulated systems can include over a hundred domains. By analyzing top views and cross sections of thin films, it is possible to determine the degree of ordering and the properties of individual domains. First, the influence of confinement on ordering perfection is examined. By focusing on the influence of trench width and sidewall selectivity, one can identify conditions that yield defect-free arrays with a high reliability and for which domains exhibit a high degree of uniformity across the...
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