Abstract
We present the first demonstration of integrated waveguides in planar silica devices fabricated using direct UV writing with 213 nm laser light. Waveguides were produced with different writing fluences and the NA and MFD of each were measured. Single mode waveguides were achieved at fluence values one-tenth that typically required when operating with a 244 nm laser, allowing for more rapid fabrication. A maximum in-plane index change of 2.4 ×10-3 for a writing fluence of 5 kJ cm-2 was estimated from NA measurements. Finally cutback measurements were performed and a propagation loss of 0.42 ± 0.07 dB cm-1 was directly measured, though losses as low as 0.2 ± 0.03 dB/cm are indicated through calculations.
Highlights
Integrated optics is an enabling technology for fields such as sensing, communications and quantum technologies [1,2,3]
Bragg gratings in Ge-doped optical fibre have been achieved without the need for hydrogenation by using a deep UV laser operating at 213 nm [11]
Planar photonic waveguides were written in silica using a UV laser operating at 213 nm
Summary
Integrated optics is an enabling technology for fields such as sensing, communications and quantum technologies [1,2,3]. Silica photonics offers reduced optical losses over other techniques for transmission in the visible and near infrared, and possesses other optical properties including non-linear attributes [4, 5]. Direct Ultra-Violet Writing (DUW) commonly employs a 244 nm frequency doubled Argon Ion or 248 nm Excimer UV laser to induce a refractive index change [6]. Using this approach photonic structures - such as beam splitters, couplers and Bragg gratings - can be achieved in germanium and boron doped silica. We present the first planar silica waveguides fabricated through the DUW technique by using a 213 nm UV laser.
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