Direct Photoreduction of Graphene Oxide Film for Flexible Electronics using Femtosecond Laser Pulses

Abstract

In recent years, we have witnessed a massive demand in flexible electronics. Graphene, the first two-dimensional material with carbon atoms arranged in a hexagonal lattice, has attracted great interest in this rapidly growing area. Although graphene can be synthesized using several methods such as liquid-phase exfoliation [1], mechanical exfoliation [2], and chemical vapor deposition [3], one-step fabrication of high-resolution graphene patterns on heat-sensitive polymer substrate for flexible electronics is still a challenge. Herein, we utilized femtosecond direct laser writing (FsDLW) to locally photo-reduce graphene oxide (GO) and form high-resolution reduced graphene oxide (rGO) patterns directly on polymer substrates. Furthermore, electrical conductivity, surface morphology, and chemical composition of graphene patterns were precisely controlled. Owing to one-step fabrication, mask-free patterning, high-resolution, and weak photothermal effect induced by the femtosecond laser, FsDLW is a promising candidate which can enable a new revolution in flexible electronics.